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NTS260ESFT1G - onsemi

Description: Fine Lithography Trench−based Schottky Technology for Very Low Leakage; Fast Switching with Exceptional Temperature Stability; Low Power Loss and Lower Operating Temperature; Higher Efficiency for Achieving Regulatory Compliance; Low Thermal Resistance; High Surge Capability; These are Pb−Free and Halide−Free Devices

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NTS260ESFT1G - onsemi

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